WEKO3
アイテム
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RF反応性スパッタリングによるCNx膜形成における摩擦特性に及ぼすスパッタガスの影響
https://cit.repo.nii.ac.jp/records/74
https://cit.repo.nii.ac.jp/records/74d729ae43-fa27-4e11-927e-17535afb832c
名前 / ファイル | ライセンス | アクション |
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Item type | 紀要論文_JAIRO Cloud(WEKO3)対応_56aaa311(1) | |||||
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公開日 | 2014-12-25 | |||||
タイトル | ||||||
タイトル | RF反応性スパッタリングによるCNx膜形成における摩擦特性に及ぼすスパッタガスの影響 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Effects of spattering gas on the friction property of CNx films prepared by RF reactive sputtering | |||||
言語 | ||||||
言語 | jpn | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | CNx,Ramen specroscopy,nano-indention,friction test, RF sputtering | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
著者 |
坂本, 幸弘
× 坂本, 幸弘× 城谷, 友保× 斎藤, 邦夫× 川名, 淳雄 |
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書誌情報 |
千葉工業大学研究報告 en : Report of Chiba Insitute of Technology 巻 62, p. 9-14, 発行日 2015-01-01 |
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出版者 | ||||||
出版者 | Chiba Institute of Technology |